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Company Details

Annealsys manufactures Rapid Thermal Processing and Chemical Vapor Deposition equipment for R&D and production.
RTP systems are available from 2 to 8-inch for RTP and RTCVD. Cold wall chamber, high temperature (1500°C) and high vacuum capability are the main features.
MOCVD tools dedicated to oxide and metal deposition are available from 2-inch up to 200 mm
2-inch Spray-CVD tool with in situ annealing capability.
LPCVD furnace for 4-inch wafers.
Annealsys provides worldwide sales and service.

  Company Name ANNEALSYS
  Business Type Manufacturer
  Industry Industrial Supplies
  Street Address Bat T2, PIT la Pompignane, Rue de la Vieille Poste
  Zip/Postal Code 34055
  Job Title Director/CEO/General Manager
  Name Franck Laporte
  Phone 33  467202363
  Fax 33  467202689
Production & Inspection >> Thin-film Panel Production Equipment >> Coating/Deposition
Cell & Module >> Thin-Film >> CIS/CIGS
  Main Market Worldwide
  Key Product/Services R&D systems for Rapid Thermal Processing (annealing, crystallization, selenization), Spray-CVD (Transparent conductive oxides), LPCVD and MOCVD.
  Web Address http://www.annealsys.com

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